Process Overview

Furnaces used for halogen purification of graphite in the semiconductor industry require high-temperature capabilities and sophisticated gas management systems. A purification furnace utilizes differential pressure controls to contain reactive halogen gases inside a closed retort. This design protects the hot zone, vacuum chamber, and instrumentation, resulting in longer life expectancy for serviceable components. Scrubber systems can also be provided to neutralize highly corrosive by-products such as chlorides and fluorides.

Application

• Halogen Purification of Graphite
• Semiconductor-Grade Graphite Processing
• Removal of Metallic and Non-Metallic Impurities
• High-Purity Carbon Component Manufacturing
• Production of Graphite for Solar and Electronics Industries
• Purification of Carbon-Based Refractory Materials
• Specialty Graphite Treatment for Nuclear Applications
• Chemical Vapor Treatment under Controlled Atmospheres
• Research and Development in High-Purity Materials